High Performance Carbon Nanotube-Based Semiconductors
Scalable, substrate-agnostic deposition process for the alignment of semiconducting nanotubes
SixLine Semiconductor has solved a fundamental 20-year challenge of creating dense, highly aligned, semiconducting nanotubes for broad platform integration. Their selective nanotube deposition process in specific and registered locations enable multi-step fabrication processes and integration.
Executive Summary
Technology Quick Pitch
Inventor Profiles
Mike Arnold |
Katy Jinkins |
Publications
- Aligned 2D Carbon Nanotube Liquid Crystals for Wafer-Scale Electronics (2021)
- Substrate-Wide Confined Shear Alignment of Carbon Nanotubes for Thin Film Transistors (2018)
- Nanotube Alignment Mechanism in Floating Evaporative Self-Assembly (2017)
Patents
- U.S. Patent No. 10,873,026
- U.S. Patent Application Publication No. US-2022-0255001
- Technology summary 1
- Technology summary 2
- Technology summary 3
Additional Information
If you are interested in learning about WARF Accelerator technologies, please contact:
Lesli Mark, [email protected], 608.960.9903